Investigation of thermo-chemical polishing of CVD diamond film

被引：0

作者：

Chou, W.C. ^{[1
]}

Chao, C.L. ^{[1
]}

Chien, H.H. ^{[2
]}

Ma, K.J. ^{[3
]}

Lin, H.Y. ^{[3
]}

机构：

[1] Department of Mechanical and Electro-Mechanical Engineering, Tam-Kang University, No.151 Ying-Chuan Road, Tamsui, Taipei Hsien-251, Taiwan

[2] Department of Mechanical Engineering, Chung-Hua University, Hsin-Chu, 30067, Taiwan

[3] MIRL, Industrial Technology Research Institute, Chu-Tung, Hsin-Chu, Taiwan

来源：

Key Engineering Materials | 2007年 / 329卷

关键词：

Chemical polishing - Diamonds - Single crystals - Zinc oxide;

D O I：

10.4028/0-87849-416-2.195

中图分类号：

学科分类号：

摘要：

ZnO/Diamond structure has attracted a lot of attentions and heavy investment recently just because diamond has the capability of producing very high surface acoustic wave (around 10,000m/s). In this present study, the microwave chemical vapor deposition (CVD) method was employed to produce diamond films on silicon single crystal. Thermo-chemical polishing experiments were then conducted on the obtained diamond films. The underlying material removal mechanisms, microstructure of the machined surface and related machining conditions were also investigated. Thermo-chemical polishing was proved to be able to remove the diamond film very effectively (4.8μm deep of diamond film was removed in 30 minutes when polishing at 550°C and 5.7m/s). The material removal rate was increased with polishing speed and pressure. Higher polishing temperature would improve the chemical reaction and result in better surface finish.

引用

页码：195 / 200

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