共 50 条
- [41] Ultra-Thin, High Quality HfO2 on Strained-Ge MOS Capacitors with Low Leakage Current SIGE, GE, AND RELATED COMPOUNDS 6: MATERIALS, PROCESSING, AND DEVICES, 2014, 64 (06): : 267 - 271
- [46] The kinetics of phase formation in an ultra-thin nanoscale layer ZEITSCHRIFT FUR METALLKUNDE, 2003, 94 (10): : 1162 - 1168
- [49] Effect of Calcination Temperature on Phase Transformation of HfO2 Nanoparticles ADVANCED MATERIALS AND RADIATION PHYSICS (AMRP-2015), 2015, 1675
- [50] Ultra-thin SiON and high-k HfO2 gate dielectric metrology using transmission electron microscopy IPFA 2004: PROCEEDINGS OF THE 11TH INTERNATIONAL SYMPOSIUM ON THE PHYSICAL & FAILURE ANALYSIS OF INTEGRATED CIRCUITS, 2004, : 135 - 138