Diagnostic of microwave ECR unbalanced magnetron sputtering plasma by Langmuir probe

被引：0

作者：

Zhang, Zhiguo ^{[1
]}

Chen, Xiaomeng ^{[1
]}

Liu, Tianwei ^{[1
]}

Xu, Jun ^{[1
]}

Deng, Xinlu ^{[1
]}

Dong, Chuang ^{[1
]}

机构：

[1] State Key Laboratory of Materials Modification, Dalian University of Technology, Dalian 116024, China

来源：

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2005年 / 25卷 / 02期

关键词：

Electric discharges - Electric field effects - Electron cyclotron resonance - Magnetron sputtering - Microwaves - Plasma diagnostics - Plasma probes;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Langmuir probe has been used to diagnose microwave electron cyclotron resonance (ECR) unbalanced magnetron sputtering plasma. The relationship between the micro-parameters of the plasma and the macro-parameters of the system is given. We observed that the ion density reaches (1010-1011) cm-3 near the substrate holder. The electron temperature ranges from 5 eV to 10 eV. With the increase in the sputtering target power, the ion density reaches the maximum 1.5 × 1011 cm-3 when the sputter target power is 130 W. It is also the maximum when the microwave power reaches 850 W. The electron temperature and plasma potential show the same tendencies with respect to the ion density.

引用

页码：110 / 114

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