TiNi SMA microactuator thin films by ion beam sputter deposition

被引:0
|
作者
Tsuchiya, Kazuyoshi
Davies, Sam T.
机构
关键词
D O I
10.2493/jjspe.68.83
中图分类号
学科分类号
摘要
17
引用
收藏
页码:83 / 87
相关论文
共 50 条
  • [1] Ion beam sputter deposition of TiNi shape memory alloy thin films
    Davies, ST
    Tsuchiya, K
    MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY V, 1999, 3874 : 165 - 172
  • [2] Ion beam sputter deposition of zirconia thin films
    Jin Weihua
    Jin Chunshui
    Liu Lei
    Zhu Hongli
    Yang Huaijiang
    INTERNATIONAL SYMPOSIUM ON PHOTOELECTRONIC DETECTION AND IMAGING 2007: OPTOELECTRONIC SYSTEM DESIGN, MANUFACTURING, AND TESTING, 2008, 6624
  • [3] Variation of the deposition rate during ion beam sputter deposition of optical thin films
    Liu, HX
    Xiong, SM
    Li, LH
    Zhang, YD
    THIN SOLID FILMS, 2005, 484 (1-2) : 170 - 173
  • [4] TiNi thin films for microactuators and microdevices: Sputter deposition and processing techniques
    Martynov, V
    THERMEC'2003, PTS 1-5, 2003, 426-4 : 3475 - 3480
  • [5] DENSITY OF THE BORON THIN FILMS OBTAINED BY ION BEAM SPUTTER DEPOSITION.
    Hojou, Kiichi
    Shinku/Journal of the Vacuum Society of Japan, 1984, 27 (07): : 589 - 595
  • [6] ION-BEAM SPUTTER DEPOSITION OF LAYERED MAGNETIC THIN-FILMS
    SMITS, JW
    ALGRA, HA
    ENZ, U
    VANSTAPELE, RP
    JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 1983, 35 (1-3) : 89 - 92
  • [7] Charge assisted deposition of polycrystalline silicon thin films by cesium sputter ion beam deposition
    Lee, DY
    Kim, YH
    Kim, IK
    Choi, DJ
    Jeong, SM
    Koo, WH
    Lee, SM
    Baik, HK
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (10): : 6880 - 6883
  • [8] Charge assisted deposition of polycrystalline silicon thin films by cesium sputter ion beam deposition
    Baik, H.K. (thinfilm@yonsei.uc.kr), 1600, Japan Society of Applied Physics (43):
  • [9] Fabrication of TiNi shape memory alloy microactuators by ion beam sputter deposition
    Univ of Warwick, Coventry, United Kingdom
    Nanotechnology, 2 (67-71):
  • [10] Fabrication of TiNi shape memory alloy microactuators by ion beam sputter deposition
    Tsuchiya, K
    Davies, ST
    NANOTECHNOLOGY, 1998, 9 (02) : 67 - 71