Cluster magnetorheological effect plane polishing technology

被引：19
|
作者：
Pan, Jisheng [1 ]
Yan, Qiusheng [1 ]
Lu, Jiabin [1 ]
Xu, Xipeng [2 ]
Chen, Senkai [1 ]
机构：
[1] School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China
[2] Engineering Research Center for Brittle Materials Machining, Huaqiao University, Xiamen 361021, China
来源：
Jixie Gongcheng Xuebao/Journal of Mechanical Engineering | 2014年 / 50卷 / 01期
关键词：
Silicon wafers;
D O I：
10.3901/JME.2014.01.205
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：205 / 212
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