The future of the CD-SEM: A possible agenda

被引:0
|
作者
Joy, David C. [1 ]
机构
[1] Sci. and Engineering Research Ctr., 1414 Circle Drive, Knoxville, TN 37996-0840, United States
来源
Microlithography World | 2002年 / 11卷 / 03期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
6
引用
收藏
页码:4 / 6
相关论文
共 50 条
  • [41] Rotation-induced measurement error by a CD-SEM
    Jhaveri, TK
    Cottle, R
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XVII, PTS 1 AND 2, 2003, 5038 : 1161 - 1167
  • [42] Reticle imaging and metrology using a CD-SEM at IMEC
    James, A
    Felten, F
    Polli, M
    England, J
    Marschner, T
    Vandenberghe, G
    16TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2000, 3996 : 128 - 133
  • [43] Limits of model-based CD-SEM metrology
    Belissard, Jordan
    Hazart, Jerome
    Labbe, Stephane
    Triki, Faouzi
    34TH EUROPEAN MASK AND LITHOGRAPHY CONFERENCE, 2018, 10775
  • [44] High sensitivity tracking of CD-SEM performance: QSEM
    Babin, S.
    Huang, Jaffee
    Yushmanov, P.
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXIX, 2015, 9424
  • [45] Characterization of a 'First Measurement Effect' in CD-SEM measurement
    Cai, Boxiu
    Lin, Yi-Shih
    Wu, Qiang
    Huang, Yi
    Yang, Siyuan
    Li, Wen-Hui
    Hao, Michael
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVII, 2013, 8681
  • [46] CD bias reduction in CD-SEM linewidth measurements for advanced lithography
    Tanaka, Maki
    Meessen, Jeroen
    Shishido, Chie
    Watanabe, Kenji
    Minnaert-Janssen, Ingrid
    Vanoppen, Peter
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2, 2008, 6922 (1-2):
  • [47] Evaluation of a transmission CD-SEM for EB stencil masks
    Ishikawa, M
    Fujita, H
    Hoga, M
    Sano, H
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY X, 2003, 5130 : 898 - 906
  • [48] Influence of mask surface processing on CD-SEM imaging
    Hauptmann, Marc
    Eng, Lukas M.
    Richter, Jan
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
  • [49] Influence of Sidewall Perturbations on CD-SEM Line Roughness Metrology
    Bunday, Benjamin D.
    Mack, Chris A.
    Borisov, Sergei
    Sinitsina, Vera
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIII, 2019, 10959
  • [50] CD measurement evaluation on periodic patterns between optic tools and CD-SEM
    Choi, Yongkyoo
    Kim, Munsik
    Oh, Sunghyun
    Han, Oscar
    PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349