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- [45] Characterization of a 'First Measurement Effect' in CD-SEM measurement METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVII, 2013, 8681
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- [48] Influence of mask surface processing on CD-SEM imaging PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XV, PTS 1 AND 2, 2008, 7028
- [49] Influence of Sidewall Perturbations on CD-SEM Line Roughness Metrology METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXXIII, 2019, 10959
- [50] CD measurement evaluation on periodic patterns between optic tools and CD-SEM PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349