Design of 1064 nm, 532 nm, 355 nm frequency-tripled antireflection coating for LBO

被引:0
|
作者
Tan, Tianya [1 ,2 ,3 ]
Huang, Jianbing [3 ]
Zhan, Meiqiong [3 ]
Shao, Jianda [3 ]
Fan, Zhengxiu [3 ]
Wu, Wei [1 ,2 ]
Guo, Yongxin [1 ,2 ]
机构
[1] Department of Physics, Liaoning University, Shenyang 110036, China
[2] Shenyang Municipal Key Lab. of Photoelectronic Devices and Detection Technolog, Shenyang 110036, China
[3] Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
来源
Guangxue Xuebao/Acta Optica Sinica | 2007年 / 27卷 / 07期
关键词
Deposition rates - Error analysis - Reflection - Refractive index - Thin films;
D O I
暂无
中图分类号
学科分类号
摘要
1064 nm, 532 nm, 355 nm frequency-tripled antireflection (AR) coating was designed on LiB3O5 (LBO) substrate with vector method. The design result showed that the residual reflectivity at wavelength of 1064 nm, 532 nm and 355 nm could be 0.0017%, 0.0002% and 0.0013%, respectively. According to error analysis, the reflectivity increased to 0.20% at 1064 nm, 0.84% at 532 nm and 1.89% at 355 nm when the precision of deposition rate was controlled at + 5.5%. If the refractive index accuracy was + 3%, the reflectivity reached 0.20% at 1064 nm, 0.88% at 532 nm and 0.24% at 355 nm, respectively. The refractive index had more effect on the residual reflectivity of the antireflection coating than the physical thickness. From the incident medium to the substrate, the thickness variation of the second layer had the most effect on the reflectivity of the antireflection coating at 1064 nm and 355 nm, followed by the first layer, and the layer next to the substrate was most insensitive. At 532 nm, the first and third layers were the sensitive layers of the antireflection coating design. The reflectance of the antireflection coating at 1064 nm, 532 nm and 355 nm increased to 0.15%, 0.31% and 1.52%, respectively due to the dispersion of the coating materials.
引用
收藏
页码:1327 / 1332
相关论文
共 50 条
  • [41] Reversing precancerous actinic damage by mixing wavelengths (1064 nm, 532 nm)
    Demetriou, Constantinos
    JOURNAL OF COSMETIC AND LASER THERAPY, 2011, 13 (03) : 113 - 119
  • [42] Performance and comparison of 532nm and 355nm groundwinds lidars
    Dehring, MT
    Nardell, CA
    Pavlich, JC
    Hays, PB
    Dors, IG
    LIDAR REMOTE SENSING FOR INDUSTRY AND ENVIRONMENT MONITORING III, 2003, 4893 : 337 - 347
  • [43] Random Surface Texturing of mc-Silicon for Solar Cells with Picosecond Lasers; a Comparison between 1064 nm, 532 nm and 355 nm Laser Emission Wavelengths
    Binetti, Simona
    Le Donne, Alessia
    Rolfi, Andrea
    Grilli, Emanuele
    Jaeggi, Beat
    Neuenschwander, Beat
    Busto, Chiara
    Scorticati, Davide
    Longoni, Luca
    Pellegrino, Sergio
    2015 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2015,
  • [44] Compact laser diode end-pumped Nd: YAG intracavity frequency-tripled quasi-continuous 355 nm laser
    Liu Huan
    Gong Ma-Li
    ACTA PHYSICA SINICA, 2009, 58 (10) : 7000 - 7004
  • [45] Efficacy of laser treatment of tattoos using lasers emitting wavelengths of 532 nm, 755 nm and 1064 nm
    Prinz, BM
    Vavricka, SR
    Graf, P
    Burg, G
    Dummer, R
    BRITISH JOURNAL OF DERMATOLOGY, 2004, 150 (02) : 245 - 251
  • [46] A 1064nm, 532nm, AND 755nm LASER SYSTEM FOR THE TREATMENT OF UNWANTED TATTOOS
    Bloom, Bradley
    Alabdulrazzaq, Hamad
    Bae, Yoon-Soo
    Brauer, Jeremy
    Neckman, Julia
    Bernstein, Leonard
    Weiss, Elliot
    Anolik, Robert
    Geronemus, Roy
    LASERS IN SURGERY AND MEDICINE, 2016, 48 : 13 - 13
  • [47] CLINICAL EVALUATION OF THE PICOSECOND 532 nm, 755nm AND 1064nm WAVELENGTHS FOR THE REMOVAL OF TATTOOS
    Prather, Heidi
    Desai, Shraddha
    Kruter, Laura
    Depina, Joaninha
    Doherty, Sean
    Arndt, Kenneth
    Dover, Jeffrey
    LASERS IN SURGERY AND MEDICINE, 2015, 47 : 20 - 20
  • [48] Monte Carlo simulations and photoacoustic experiments to compare imaging depth at 532 nm, 800 nm, and 1064 nm
    Sharma, Arunima
    Srishti
    Periyasamy, Vijitha
    Pramanik, Manojit
    PHOTONS PLUS ULTRASOUND: IMAGING AND SENSING 2020, 2020, 11240
  • [49] Micromachining of copper using Nd : YAG laser radiation at 1064, 532, and 355 nm wavelengths
    Tunna, L
    Kearns, A
    O'Neill, W
    Sutcliffe, CJ
    OPTICS AND LASER TECHNOLOGY, 2001, 33 (03): : 135 - 143
  • [50] Damage characteristics of polysilicon under wavelengths of 1 064 nm, 532 nm and 355 nm laser irradiation
    Zhuang, Xuhua (zhuangxuhua@yeah.net), 2015, Chinese Society of Astronautics (44):