Relationship between the physical and structural properties of Nb z Siy Nx thin films deposited by dc reactive magnetron sputtering

被引：0
|
作者：
Sanjińs, R. [1 ]
Benkahoul, M. [1 ]
Sandu, C.S. [1 ]
Schmid, P.E. [1 ]
Ĺvy, F. [1 ]
机构：
[1] Ecole Polytechnique F´d´rale de Lausanne (EPFL), Institut de Physique de la Matìre Complexe, CH-1015 Lausanne, Switzerland
来源：
Journal of Applied Physics | 2005年 / 98卷 / 12期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1 / 6
相关论文
共 50 条
  • [41] Photoelectric properties of ITO thin films deposited by DC magnetron sputtering
    柳伟
    程树英
    半导体学报, 2011, 32 (01) : 17 - 20
  • [42] Optical properties of AlNxOy thin films deposited by DC magnetron sputtering
    Borges, J.
    Alves, E.
    Vaz, F.
    Marques, L.
    INTERNATIONAL CONFERENCE ON APPLICATIONS OF OPTICS AND PHOTONICS, 2011, 8001
  • [43] INVESTIGATION OF THE PROPERTIES OF SILVER THIN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING
    Wang, Linwen
    Li, Ling
    Chen, Wei-Dong
    SURFACE REVIEW AND LETTERS, 2017, 24 (04)
  • [44] Photoelectric properties of ITO thin films deposited by DC magnetron sputtering
    Liu Wei
    Cheng Shuying
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (01)
  • [45] Structural and Optical Properties of Mg Doped ZnO Thin Films Deposited by DC Magnetron Sputtering
    Asvarov, A. Sh.
    Makhmudov, S. Sh.
    Abduev, A. Kh.
    Akhmedov, A. K.
    Aliev, M. A.
    Bilalov, B. A.
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2016, 8 (04)
  • [46] Physical properties of W2N thin films deposited by reactive magnetron sputtering
    Mostovyi, Andrii, I
    Solovan, Mykhailo M.
    Maryanchuk, Pavlo D.
    FOURTEENTH INTERNATIONAL CONFERENCE ON CORRELATION OPTICS, 2020, 11369
  • [47] Structural, mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering
    Arslan, E.
    SURFACE ENGINEERING, 2010, 26 (08) : 615 - 619
  • [48] Growth, structural, and magnetic properties of iron nitride thin films deposited by dc magnetron sputtering
    Wang, X
    Zheng, WT
    Tian, HW
    Yu, SS
    Xu, W
    Meng, SH
    He, XD
    Han, JC
    Sun, CQ
    Tay, BK
    APPLIED SURFACE SCIENCE, 2003, 220 (1-4) : 30 - 39
  • [49] Properties of aluminium oxide thin films deposited by reactive magnetron sputtering
    Koski, K
    Hölsä, J
    Juliet, P
    THIN SOLID FILMS, 1999, 339 (1-2) : 240 - 248
  • [50] Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering
    Mazur, Michal
    Kaczmarek, Danuta
    Prociow, Eugeniusz
    Domaradzki, Jaroslaw
    Wojcieszak, Damian
    Bochenski, Jakub
    MATERIALS SCIENCE-POLAND, 2014, 32 (03): : 457 - 464
12345