Microstructure, wettability, optical and electrical properties of HfO2 thin films: Effect of oxygen partial pressure

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机构：
[1] Gao, J.
[2] He, G.
[3] Deng, B.
[4] Xiao, D.Q.
[5] Liu, M.
[6] Jin, P.
[7] Zheng, C.Y.
[8] Sun, Z.Q.
来源：
He, G. (cheriling16@126.com) | 1600年 / Elsevier Ltd卷 / 662期
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Thin films;
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