XPS study of ZrN layers deposited by reactive magnetron sputtering

被引：0
|
作者：
Del Re, Michaël [2 ]
Gouttebaron, R. [1 ]
Dauchot, J.P. [1 ]
Wautelet, M. [1 ]
Hecq, Michel [1 ]
机构：
[1] Lab. de Chim. Inorg. et Analytique, Univ. de Mons-Hainaut, Bât. Materia Nova, Parc Initialis, av. Nicolas Copernic, 7000 Mons, Belgium
[2] Lab. de Chim. Inorg. et Analytique, Univ. de Mons-Hainaut, Materia Nova, Av. Copernic, 7000 Mons, Belgium
来源：
Vide: Science, Technique et Applications | 2002年 / 2 4卷 / 304期
关键词：
Nitrogen partial pressure - Reactive magnetron sputtering - ZrNx;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：347 / 355
相关论文
共 50 条
  • [21] Study of the composition of titanium oxide films deposited by reactive magnetron sputtering
    Aubakirova, D.
    Yerdybaeva, N.
    Pichugin, V
    RECENT CONTRIBUTIONS TO PHYSICS, 2020, 74 (03): : 43 - 45
  • [22] The study of titanium oxynitride coatings solubility deposited by reactive magnetron sputtering
    Leonova, L. A.
    Boytsova, E. L.
    Pustovalova, A. A.
    VIII INTERNATIONAL SCIENTIFIC CONFERENCE - ISSUES OF PHYSICS AND TECHNOLOGY IN SCIENCE, INDUSTRY AND MEDICINE, 2016, 135
  • [23] STRUCTURAL PROPERTIES OF AlN FILMS WITH OXYGEN CONTENT DEPOSITED BY REACTIVE MAGNETRON SPUTTERING: XRD AND XPS CHARACTERIZATION
    Garcia-Mendez, Manuel
    Morales-Rodriguez, Santos
    Shaji, Sadasivan
    Krishnan, Bindu
    Bartolo-Perez, Pascual
    SURFACE REVIEW AND LETTERS, 2011, 18 (1-2) : 23 - 31
  • [24] Hardness and tribology measurements on ZrN coatings deposited by reactive sputtering technique
    Auger, M. A.
    Araiza, J. J.
    Falcony, C.
    Sanchez, O.
    Albella, J. M.
    VACUUM, 2007, 81 (11-12) : 1462 - 1465
  • [25] Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering
    Kumada, Tomoyuki
    Ohtsuka, Makoto
    Fukuyama, Hiroyuki
    AIP ADVANCES, 2015, 5 (01):
  • [26] CHARACTERIZATION OF TUNGSTEN-CARBON LAYERS DEPOSITED ON STAINLESS-STEEL BY REACTIVE MAGNETRON SPUTTERING
    PAULEAU, Y
    GOUYPAILLER, P
    JOURNAL OF MATERIALS RESEARCH, 1992, 7 (08) : 2070 - 2079
  • [27] Structure of superhard nanocrystalline (Ti,Al)N layers deposited by reactive pulsed magnetron sputtering
    Zywitzki, O.
    Klostermann, H.
    Fietzke, F.
    Modes, T.
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (22-23): : 6522 - 6526
  • [28] MICROSTRUCTURE & CORROSION RESISTANCE FOR WC-Ti-N LAYERS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
    Mateescu, O. A.
    Balan, A.
    Mateescu, Gh.
    Stamatin, I.
    Samoila, C.
    Ursutiu, D.
    Nascov, V.
    DIGEST JOURNAL OF NANOMATERIALS AND BIOSTRUCTURES, 2015, 10 (02) : 437 - 443
  • [29] GaN Films Deposited by DC Reactive Magnetron Sputtering
    Song, Pung Keun
    Yoshida, Eriko
    Sato, Yasushi
    Kim, Kwang Ho
    Shigesato, Yuzo
    Shigesato, Y. (yuzo@chem.aoyama.ac.jp), 1600, Japan Society of Applied Physics (43):
  • [30] GaN films deposited by DC reactive magnetron sputtering
    Song, PK
    Yoshida, E
    Sato, Y
    Kim, KH
    Shigesato, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2004, 43 (2A): : L164 - L166
12345