XPS study of ZrN layers deposited by reactive magnetron sputtering

被引：0
|
作者：
Del Re, Michaël [2 ]
Gouttebaron, R. [1 ]
Dauchot, J.P. [1 ]
Wautelet, M. [1 ]
Hecq, Michel [1 ]
机构：
[1] Lab. de Chim. Inorg. et Analytique, Univ. de Mons-Hainaut, Bât. Materia Nova, Parc Initialis, av. Nicolas Copernic, 7000 Mons, Belgium
[2] Lab. de Chim. Inorg. et Analytique, Univ. de Mons-Hainaut, Materia Nova, Av. Copernic, 7000 Mons, Belgium
来源：
Vide: Science, Technique et Applications | 2002年 / 2 4卷 / 304期
关键词：
Nitrogen partial pressure - Reactive magnetron sputtering - ZrNx;
D O I：
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学科分类号：
摘要：
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页码：347 / 355
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