Effect of rapid thermal processing at high temperature on generation and annihilation of thermal donors

被引:0
|
作者
Pei, Yanli [1 ]
Yang, Deren [1 ]
Ma, Xiangyang [1 ]
Fan, Ruixin [1 ]
Que, Duanlin [1 ]
机构
[1] Lab. of Silicon Mat., Zhejiang Univ., Hangzhou 310027, China
关键词
D O I
暂无
中图分类号
学科分类号
摘要
18
引用
收藏
页码:1035 / 1039
相关论文
共 50 条
  • [31] The effect of patterns on thermal stress during rapid thermal processing of silicon wafers
    Hebb, JP
    Jensen, KF
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 1998, 11 (01) : 99 - 107
  • [32] Thermal performance challenges for rapid thermal processing
    Hebb, J
    11TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS, 2003, : 3 - 12
  • [33] Generation of thermal donors in silicon: Effect of self-interstitials
    V. V. Voronkov
    G. I. Voronkova
    A. V. Batunina
    V. N. Golovina
    M. G. Mil’vidskii
    A. S. Gulyaeva
    N. B. Tyurina
    L. V. Arapkina
    Physics of the Solid State, 2000, 42 : 2022 - 2029
  • [34] Generation of thermal donors in silicon: Effect of self-interstitials
    Voronkov, VV
    Voronkova, GI
    Batunina, AV
    Golovina, VN
    Mil'vidskii, MG
    Gulyaeva, AS
    Tyurina, NB
    Arapkina, LV
    PHYSICS OF THE SOLID STATE, 2000, 42 (11) : 2022 - 2029
  • [35] COMMENT ON RAPID THERMAL ANNEALING AND REGROWTH OF THERMAL DONORS - REPLY
    STEIN, HJ
    HAHN, SK
    SHATAS, SC
    JOURNAL OF APPLIED PHYSICS, 1987, 61 (07) : 2682 - 2683
  • [36] Annealing thermal donors in CZSi crystal by rapid thermal annealing
    Luan, Hongfa
    Zhang, Guohu
    Li, Bing
    Chen, Xueqing
    Qin, Fu
    Qian, Peixin
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1995, 16 (10): : 789 - 793
  • [37] Traceable temperature calibrations of radiation thermometers for rapid thermal processing
    Tsai, BK
    11TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS, 2003, : 101 - 106
  • [38] Low temperature PECVD polysilicon crystallization by rapid thermal processing
    Stewart, M
    Hovagimian, H
    Arakkal, J
    Saha, S
    Hatalis, MK
    FLAT-PANEL DISPLAY MATERIALS-1998, 1998, 508 : 109 - 114
  • [39] SIMULATION OF TEMPERATURE EFFECTS DURING RAPID THERMAL-PROCESSING
    KAKOSCHKE, R
    BUSSMANN, E
    RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING, 1989, 146 : 473 - 482
  • [40] TEMPERATURE PROBLEMS WITH RAPID THERMAL-PROCESSING FOR VLSI APPLICATIONS
    KAKOSCHKE, R
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 : 753 - 759