Effect of rapid thermal processing at high temperature on generation and annihilation of thermal donors

被引：0
|
作者：
Pei, Yanli [1 ]
Yang, Deren [1 ]
Ma, Xiangyang [1 ]
Fan, Ruixin [1 ]
Que, Duanlin [1 ]
机构：
[1] Lab. of Silicon Mat., Zhejiang Univ., Hangzhou 310027, China
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 2003年 / 24卷 / 10期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
18
引用
收藏
页码：1035 / 1039
相关论文
共 50 条
  • [1] The effect of the growth temperature on polyoxide by rapid thermal processing
    Chang, KM
    Lee, TC
    Sun, YL
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (3A): : 1157 - 1161
  • [2] The effect of the growth temperature on polyoxide by rapid thermal processing
    Kow Ming Chang
    Tzyh Cheang Lee
    Yong Long Sun
    2001, Japan Society of Applied Physics (40):
  • [3] Study of oxide-silicon interface state generation and annihilation by rapid thermal processing
    Kurachi, Ikuo
    Takano, Hiroshi
    Kanie, Hisashi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2015, 54 (08)
  • [4] Temperature measurement in rapid thermal processing
    Timans, PJ
    SOLID STATE TECHNOLOGY, 1997, 40 (04) : 63 - &
  • [5] Annihilation of thermal double donors in silicon
    Kamiura, Y
    Takeuchi, Y
    Yamashita, Y
    JOURNAL OF APPLIED PHYSICS, 2000, 87 (04) : 1681 - 1689
  • [6] Slip generation during rapid thermal processing
    Zollner, JP
    Eichhorn, G
    Cimalla, V
    Bozmarov, J
    Zaumseil, P
    Kurschner, H
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1996, 156 (01): : 63 - 70
  • [7] Effect of rapid thermal processing on high temperature oxygen precipitation behaviour in Czochralski silicon wafer
    Ma, XY
    Lin, L
    Tian, DX
    Fu, LM
    Yang, DR
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2004, 16 (21) : 3563 - 3569
  • [8] Effect of multilayer patterns on temperature uniformity during rapid thermal processing
    Hebb, Jeffrey P.
    Jensen, Klavs F.
    1996, Electrochemical Soc Inc, Pennington, NJ, United States (143)
  • [9] The effect of multilayer patterns on temperature uniformity during rapid thermal processing
    Hebb, JP
    Jensen, KF
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (03) : 1142 - 1151
  • [10] Modeling and temperature control of rapid thermal processing
    Dassau, E
    Grosman, B
    Lewin, DR
    COMPUTERS & CHEMICAL ENGINEERING, 2006, 30 (04) : 686 - 697
12345