Dry etching of SiO2 thin films with perfluoropropenoxide-O2 and perfluoropropene-O2 plasmas

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作者：
Fracassi, Francesco [1 ]
D'Agostino, Riccardo [1 ]
Fornelli, Antonella [1 ]
Shirafuji, Tatsuru [2 ]
机构：
[1] Fracassi, Francesco
[2] D'Agostino, Riccardo
[3] Fornelli, Antonella
[4] Shirafuji, Tatsuru
来源：
Fracassi, F. (fracassi@chimica.uniba.it) | 1600年 / Japan Society of Applied Physics卷 / 41期
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页码：6287 / 6290
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