Location-control of large Si grains by dual-beam excimer-laser and thick oxide portion

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作者：
Ishihara, Ryoichi [1 ]
Burtsev, Artyom [1 ]
Alkemade, Paul F.A. [1 ]
机构：
[1] Delft Univ of Technology, Delft, Netherlands
来源：
| 1600年 / Japanese Journal of Applied Physics卷 / 39期
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