Influence of gas pressure on 147 nm emission properties of plasma display panel

被引：0
|
作者：
Uhm, Han S. [1 ]
Choi, Eun H. [2 ]
Jung, Kyu B. [2 ]
机构：
[1] Department of Molecular Science and Technology, Ajou University, San 5 Wonchon-Dong, Youngtong-Gu, Suwon 443-749, Korea, Republic of
[2] PDP Research Center, Department of Electrophysics, Kwangwoon University, 447-1 Wolgye-Dong, Nowon-Gu, Seoul 139-701, Korea, Republic of
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 2005年 / 44卷 / 8-11期
关键词：
Ionization - Light emission - Neon - Ultraviolet radiation - Vacuum - Xenon;
D O I：
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中图分类号：
学科分类号：
摘要：
The influence of gas pressure on the emission properties of vacuum ultraviolet light (VUV) with a wavelength of 147nm is investigated for the electrical discharge in plasma display panel (PDP) cells. The emission properties are studied in terms of the xenon mole fraction in a neon-xenon mixture. It is shown using a theoretical model that the xenon mole fraction corresponding to the peak emission intensity decreases as the gas pressure p increases. Moreover, the emission intensity at a high xenon mole fraction decreases more significantly as the gas pressure increases. Experimental observations agree well with theoretical predictions. © 2005 The Japan Society of Applied Physics.
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页码：8 / 11
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