Isotopic labeling studies of interactions of nitric oxide and nitrous oxide with ultrathin oxynitride layers on silicon

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作者：
Lu, H.C.
Gusev, E.P.
Garfunkel, E.
Busch, B.W.
Gustafsson, T.
Sorsch, T.W.
Green, M.L.
机构：
[1] Departments of Physics and Chemistry, Rutgers University, Piscataway, NJ 08854-8019, United States
[2] Bell Laboratories, Lucent Technology, Murray Hill, NJ 07974, United States
[3] IBM Thomas J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598, United States
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| 1600年 / American Institute of Physics Inc.卷 / 87期
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