Growth of VO2 films by atomic layer deposition and its properties

被引：0
|
作者：
Li, Jianguo [1 ]
Hui, Longfei [1 ]
Feng, Hao [1 ]
Qin, Lijun [1 ]
Gong, Ting [1 ]
An, Zhongwei [1 ]
机构：
[1] Xi'an Modern Chemistry Research Institute, Xi'an, China
来源：
Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology | 2015年 / 35卷 / 02期
关键词：
D O I：
10.13922/j.cnki.cjovst.2015.02.21
中图分类号：
学科分类号：
摘要：
16
引用
收藏
页码：243 / 249
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