Ellipsometric monitoring of first stages of graphene growth in plasma-enhanced chemical vapor deposition

被引：0
|
作者：
Hayashi Y. [1 ]
Ishidoshiro S. [1 ]
Yamada S. [1 ]
Kawamura Y. [1 ]
机构：
[1] Department of Electronics, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto
来源：
| 1600年 / Vacuum Society of Japan卷 / 60期
关键词：
Coordinate plane - Ellipsometric parameters - Graphene growth - Magnetron plasmas - Substrate surface;
D O I：
10.3131/jvsj2.60.135
中图分类号：
学科分类号：
摘要：
Ellipsometry monitoring was carried out in-situ for the analyses of substrate surface in the first stages of graphene growth in magnetron plasma-enhanced chemical vapor deposition. By the comparison of the experimentally obtained trajectory of ellipsometric parameters on the Ψ-Δ coordinate plane to that of the calculated ones, it has been found that graphene tends to grow parallel to substrate surface under the pressure of 10 Pa while perpendicularly under that of 200 Pa.
引用
收藏
页码：135 / 138
页数：3
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