Interpretation of dominant impurities in Cu films by secondary ion mass spectrometry and glow discharge mass spectrometry

被引：0
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作者：
Lim, Jae-Won [1 ]
Bae, Joon Woo [1 ]
Mimura, Kouji [1 ]
Isshiki, Minoru [1 ]
机构：
[1] Inst. Multidisc. Res. for Adv. Mat., Tohoku University, Sendai 980-8577, Japan
来源：
Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap | / 1 A卷 / 373-374期
关键词：
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摘要：
Electric potential - Electromigration - Glow discharges - Ion beams - Pressure effects - Schematic diagrams - Secondary ion mass spectrometry - Silicon - Thin films
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