Nanocrystalline Ti Films Deposited by Modulated Pulsed Power Magnetron Sputtering

被引：0

作者：

Yang, Chao ^{[1
]}

Jiang, Bailing ^{[1
]}

Wang, Di ^{[1
]}

Huang, Bei ^{[1
]}

Dong, Dan ^{[1
]}

机构：

[1] School of Materials Science and Engineering, Xi'an University of Technology, Xi'an,710048, China

来源：

Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2019年 / 48卷 / 11期

关键词：

Ionization - Thin films - Nanocrystals;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Modulated pulsed power magnetron sputtering (MPPMS) has the ability to control the ionization rate, energy and quantity of deposited particles through adjusting the pulsed intensity and duration, thus modifying the nucleation and growth process of the thin film. Nanocrystalline Ti films were deposited using MPPMS technique in a closed field unbalanced magnetron sputtering (CFUBMS) system under different peak target power densities of the strong-ionized period (Pd). The modulated pulse power (MPP) was employed to modify the Pd by varying the pulse lengths and the average target powers. The results show that the nanocrystalline Ti film with a grain size of 11 nm exhibits a dense microstructure and a smooth surface (roughness of 11 nm) when the Pd is 0.86 kW•cm-2. The improved properties of the as-prepared Ti film were also discussed. Copyright © 2019, Northwest Institute for Nonferrous Metal Research. Published by Science Press. All rights reserved.

引用

页码：3433 / 3440

共 50 条

[31] Stress release and adhesion stability of TiN films deposited by high power pulsed magnetron sputtering
School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu
610031, China
不详
448000, China
Surf. Technol., 2019, 9 (245-251): : 245 - 251
[32] Preparation of Alumina Thin Films by Reactive Modulated Pulsed Power Magnetron Sputtering with Millisecond Pulses
Tumarkin, Alexander V.
Kolodko, Dobrynya V.
Kharkov, Maksim M.
Stepanova, Tatiana V.
Kaziev, Andrey V.
Samotaev, Nikolay N.
Oblov, Konstantin Yu.
COATINGS, 2024, 14 (01)
[33] Effect of N2 flow rate on the microstructure and electrochemical behavior of TaNx films deposited by modulated pulsed power magnetron sputtering
Mendizabal, L.
Bayon, R.
G-Berasategui, E.
Barriga, J.
Gonzalez, J. J.
THIN SOLID FILMS, 2016, 610 : 1 - 9
[34] Characterization of Ti?Zr?V thin films deposited by DC and unipolar pulsed DC magnetron sputtering
Wang, Sihui
Wei, Wei
Gao, Yonghao
Pan, Haibin
Wang, Yong
VACUUM, 2021, 188
[35] Large area YBCO films deposited by unipolar pulsed magnetron sputtering
Schneider, J
Einfeld, J
Lahl, P
Konigs, T
Kutzner, R
Wordenweber, R
APPLIED SUPERCONDUCTIVITY 1997, VOLS 1 AND 2, 1997, (158): : 221 - 224
[36] Nanomechanical properties of Nb films deposited by pulsed frequency magnetron sputtering
Medrano, J. G.
Rabono-Borbolla, J.
Cortazar-Martinez, O.
Herrera-Gomez, A.
Flores-Ruiz, F. J.
JOURNAL OF MATERIALS SCIENCE, 2023, 58 (36) : 14556 - 14569
[37] Nanomechanical properties of Nb films deposited by pulsed frequency magnetron sputtering
J. G. Medrano
J. Raboño-Borbolla
O. Cortazar-Martínez
A. Herrera-Gómez
F. J. Flores-Ruiz
Journal of Materials Science, 2023, 58 : 14556 - 14569
[38] Phase composition and mechanical properties of homostructure NbN nanocomposite coatings deposited by modulated pulsed power magnetron sputtering
Li, Y. G.
Yuan, H.
Jiang, Z. T.
Pan, N.
Lei, M. K.
SURFACE & COATINGS TECHNOLOGY, 2020, 385
[39] Effect of microstructure on mechanical and tribological properties of TiAlSiN nanocomposite coatings deposited by modulated pulsed power magnetron sputtering
Wu, Z. L.
Li, Y. G.
Wu, B.
Lei, M. K.
THIN SOLID FILMS, 2015, 597 : 197 - 205
[40] Recent advances in modulated pulsed power magnetron sputtering for surface engineering
Lin, Jianliang
Sproul, William D.
Moore, John J.
Wu, Zhili
Lee, Sabrina
Chistyakov, Roman
Abraham, Bassam
JOM, 2011, 63 (06) : 48 - 58

← 1 2 3 4 5 →