Nanocrystalline Ti Films Deposited by Modulated Pulsed Power Magnetron Sputtering

被引：0
|
作者：
Yang, Chao [1 ]
Jiang, Bailing [1 ]
Wang, Di [1 ]
Huang, Bei [1 ]
Dong, Dan [1 ]
机构：
[1] School of Materials Science and Engineering, Xi'an University of Technology, Xi'an,710048, China
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2019年 / 48卷 / 11期
关键词：
Ionization - Thin films - Nanocrystals;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Modulated pulsed power magnetron sputtering (MPPMS) has the ability to control the ionization rate, energy and quantity of deposited particles through adjusting the pulsed intensity and duration, thus modifying the nucleation and growth process of the thin film. Nanocrystalline Ti films were deposited using MPPMS technique in a closed field unbalanced magnetron sputtering (CFUBMS) system under different peak target power densities of the strong-ionized period (Pd). The modulated pulse power (MPP) was employed to modify the Pd by varying the pulse lengths and the average target powers. The results show that the nanocrystalline Ti film with a grain size of 11 nm exhibits a dense microstructure and a smooth surface (roughness of 11 nm) when the Pd is 0.86 kW•cm-2. The improved properties of the as-prepared Ti film were also discussed. Copyright © 2019, Northwest Institute for Nonferrous Metal Research. Published by Science Press. All rights reserved.
引用
收藏
页码：3433 / 3440
相关论文
共 50 条
  • [1] Nanocrystalline Ti Films Deposited by Modulated Pulsed Power Magnetron Sputtering
    Yang Chao
    Jiang Bailing
    Wang Di
    Huang Bei
    Dong Dan
    RARE METAL MATERIALS AND ENGINEERING, 2019, 48 (11) : 3433 - 3440
  • [2] Structurally laminated CrN films deposited by multi pulse modulated pulsed power magnetron sputtering
    Lin, Jianliang
    Sproul, William D.
    Moore, John J.
    Chistyakov, Roman
    Abraham, Bassam
    SURFACE & COATINGS TECHNOLOGY, 2011, 206 (07): : 1780 - 1786
  • [3] The β to α phase transition of tantalum coatings deposited by modulated pulsed power magnetron sputtering
    Myers, Sterling
    Lin, Jianliang
    Souza, Roberto Martins
    Sproul, William D.
    Moore, John J.
    SURFACE & COATINGS TECHNOLOGY, 2013, 214 : 38 - 45
  • [4] Effects of sputtering power on properties of PbSe nanocrystalline thin films deposited by RF magnetron sputtering
    Feng, Wenran
    Wang, Xiaoyang
    Zhou, Hai
    Chen, Fei
    VACUUM, 2014, 109 : 108 - 111
  • [5] Effects of sputtering power on structure and properties of Ti films deposited by DC magnetron sputtering
    Department of Physics, Key Laboratory for Irradiation Physics and Technology, Sichuan University, Chengdu 610064, China
    不详
    不详
    Qiangjiguang Yu Lizishu, 2006, 6 (961-964):
  • [6] A comparison of the oxidation behavior of CrN films deposited using continuous dc, pulsed dc and modulated pulsed power magnetron sputtering
    Lin, Jianliang
    Zhang, Ningyi
    Sproul, William D.
    Moore, John J.
    SURFACE & COATINGS TECHNOLOGY, 2012, 206 (14): : 3283 - 3290
  • [7] Structure of superhard nanocrystalline (Ti,Al)N layers deposited by reactive pulsed magnetron sputtering
    Zywitzki, O.
    Klostermann, H.
    Fietzke, F.
    Modes, T.
    SURFACE & COATINGS TECHNOLOGY, 2006, 200 (22-23): : 6522 - 6526
  • [8] Structure and properties of Ti films deposited by dc magnetron sputtering, pulsed dc magnetron sputtering and cathodic arc evaporation
    Yang, Chao
    Jiang, Bailing
    Liu, Zheng
    Hao, Juan
    Feng, Lin
    SURFACE & COATINGS TECHNOLOGY, 2016, 304 : 51 - 56
  • [9] Characteristic process parameters of NbN coatings deposited by modulated pulsed power magnetron sputtering
    Li, Yu-Ge
    Yuan, Hai
    Jiang, Zhi-Tao
    Lei, Ming-Kai
    Surface Technology, 2019, 48 (08): : 302 - 308
  • [10] Tribological behavior of thick CrN coatings deposited by modulated pulsed power magnetron sputtering
    Lin, Jianliang
    Sproul, William D.
    Moore, John J.
    SURFACE & COATINGS TECHNOLOGY, 2012, 206 (8-9): : 2474 - 2483
12345