Diffusion during growth and annealing of Co/Cu(111) films

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作者：
Su, Run [1 ]
Liu, Feng-Qin [1 ]
Qian, Hai-Jie [1 ]
Kurash, Hai-Jie [1 ]
机构：
[1] Synchrotron Radiation Laboratory, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100039, China
来源：
Wuli Xuebao/Acta Physica Sinica | 2002年 / 51卷 / 10期
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