Monte Carlo study of Ti film on Al substrate under high-intensity pulsed ion beam irradiation

被引：0
|
作者：
Wu, Di [1 ]
Wang, Jing [1 ]
Zhang, Jianhong [2 ]
Gong, Ye [2 ]
机构：
[1] College of Physical Science and Technology, Dalian University, Dalian 116622, China
[2] Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Dalian 116024, China
来源：
Jisuan Wuli/Chinese Journal of Computational Physics | 2010年 / 27卷 / 03期
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D O I：
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学科分类号：
摘要：
9
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页码：423 / 427
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