Low temperature, area-selective atomic layer deposition of NiO and Ni

被引：0

作者：

Nallan, Himamshu C. ^{[1
]}

Yang, Xin ^{[1
]}

Coffey, Brennan M. ^{[1
]}

Ekerdt, John G. ^{[1
]}

机构：

[1] McKetta Department of Chemical Engineering, University of Texas at Austin, Austin,TX,78712, United States

来源：

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 2022年 / 40卷 / 06期

关键词：

Nickel oxide;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

共 50 条

[21] Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification
Chen, R
Kim, H
McIntyre, PC
Porter, DW
Bent, SF
APPLIED PHYSICS LETTERS, 2005, 86 (19) : 1 - 3
[22] Surface reactions for area-selective atomic layer deposition and thermal atomic layer etching of metals and dielectrics
Parsons, Gregory
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2018, 255
[23] Blocking the lateral film growth at the nanoscale in area-selective atomic layer deposition
Ras, Robin H. A.
Sahramo, Elina
Malm, Jari
Raula, Janne
Karppinen, Maarit
Journal of the American Chemical Society, 2008, 130 (34): : 11252 - 11253
[24] Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2
Song, Seung Keun
Saare, Holger
Parsons, Gregory N.
CHEMISTRY OF MATERIALS, 2019, 31 (13) : 4793 - 4804
[25] Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation
Cho, Eun-Hyoung
Kong, Dabin
Cho, Iaan
Leem, Youngchul
Lee, Young Min
Kim, Miso
Nguyen, Chi Thang
Lee, Jeong Yub
Shong, Bonggeun
Lee, Han-Bo-Ram
CHEMISTRY OF MATERIALS, 2024, 36 (18) : 8663 - 8672
[26] Molecular Design in Area-Selective Atomic Layer Deposition: Understanding Inhibitors and Precursors
Lee, Yujin
Rothman, Amnon
Shearer, Alexander B.
Bent, Stacey F.
CHEMISTRY OF MATERIALS, 2025, 37 (05) : 1741 - 1758
[27] Blocking the lateral film growth at the nanoscale in area-selective atomic layer deposition
Ras, Robin H. A.
Sahramo, Elina
Malm, Jari
Raula, Janne
Karppinen, Maarit
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2008, 130 (34) : 11252 - +
[28] Chemistry for positive pattern transfer using area-selective atomic layer deposition
Chen, R
Bent, SF
ADVANCED MATERIALS, 2006, 18 (08) : 1086 - +
[29] Atomistic-mesoscopic modeling of area-selective thermal atomic layer deposition
Yun, Sungil
Ou, Feiyang
Wang, Henrik
Tom, Matthew
Orkoulas, Gerassimos
Christofides, Panagiotis D.
CHEMICAL ENGINEERING RESEARCH & DESIGN, 2022, 188 : 271 - 286
[30] Small size Si precursor inhibitors for area-selective atomic layer deposition
Ko, Byeong Guk
Khan, Mohammad Rizwan
Lee, Jae Kwang
Shong, Bonggeun
Kim, Woo-Hee
Lee, Han-Bo-Ram
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2018, 256

← 1 2 3 4 5 →