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- [21] Characterization of HfO2/Al2O3 Gate Dielectric Nanometer-Stacks Grown by Atomic Layer Deposition on Ge Substrates 2ND INTERNATIONAL ADVANCES IN APPLIED PHYSICS AND MATERIALS SCIENCE CONGRESS, 2012, 1476 : 21 - 25
- [27] Charge Trapping Memory with Al2O3/HfO2/Al2O3 Multilayer High-κ Dielectric Stacks and High Work Function Metal Gate Featuring Improved Operation Efficiency 2018 14TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT), 2018, : 392 - 394
- [28] HfO2/Pr2O3 gate dielectric stacks INTERNATIONAL CONFERENCE ON MICRO- AND NANO-ELECTRONICS 2016, 2016, 10224