Stress release and adhesion stability of TiN films deposited by high power pulsed magnetron sputtering

被引：0
|
作者：
School of Materials Science and Engineering, Southwest Jiaotong University, Chengdu [1 ]
610031, China
不详 [2 ]
448000, China
机构：
来源：
Surf. Technol. | 2019年 / 9卷 / 245-251期
基金：
中国国家自然科学基金;
关键词：
Hardness;
D O I：
10.16490/j.cnki.issn.1001-3660.2019.09.028
中图分类号：
学科分类号：
摘要：
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页码：245 / 251
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