Nonequilibrium Phonon Thermal Resistance at MoS2/Oxide and Graphene/Oxide Interfaces

被引：0
|
作者：
Zheng, Weidong [1 ,2 ]
McClellan, Connor J. [3 ]
Pop, Eric [3 ,4 ]
Koh, Yee Kan [1 ,2 ]
机构：
[1] Department of Mechanical Engineering, National University of Singapore, Queenstown,117576, Singapore
[2] Centre for Advanced 2D Materials, National University of Singapore, Queenstown,117542, Singapore
[3] Department of Electrical Engineering, Stanford University, Stanford,CA,94305, United States
[4] Department of Materials Science and Engineering, Stanford University, Stanford,CA,94305, United States
来源：
ACS Applied Materials and Interfaces | 2022年 / 14卷 / 19期
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页码：22372 / 22380
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