Causal Model Implementation for the Conductor Surface Roughness Effect on the Attenuation and Delay of Microstrip Lines

被引:3
|
作者
Serrano-Serrano, Maria T. [1 ]
Torres-Torres, Reydezel [1 ]
机构
[1] INAOE, Dept Elect, Puebla 72840, Mexico
基金
欧洲研究理事会;
关键词
Electromagnetic (EM) simulations; microstrip lines; S-parameters; surface roughness; METHODOLOGY; INDUCTANCE; SERIES;
D O I
10.1109/TMTT.2023.3285425
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The conductor surface roughness effect on microstrip lines is physically represented by proposing a step-by-step methodology that uses experimental S-parameters supported by electromagnetic (EM) simulations assuming smooth conductor surfaces. This avoids implementing the microstrip line model by arbitrarily fitting simulations with experimental data that include multiple-frequency-dependent effects. Furthermore, a priori knowledge of the roughness profile is not required in this proposal. From the analysis, the peak-to-valley feature of the surface roughness that allows for the representation of the corresponding effect on the electrical response of the lines is obtained. The implemented models show a correlation with experimental data up to 35 GHz.
引用
收藏
页码:64 / 73
页数:10
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