Upheaval of Negative Dielectric Permittivity and Semiconductor to Metallic Transition in a Thermally Induced Sn-Doped β-Ga2O3 (-201) Single Crystal
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Karmakar, Subrata
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Texas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USATexas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
Karmakar, Subrata
[1
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Shiam, Istiaq Firoz
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Texas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USATexas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
Shiam, Istiaq Firoz
[1
]
Manikanthababu, Nethala
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Texas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USATexas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
Manikanthababu, Nethala
[1
]
Emu, Injamamul Hoque
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Texas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USATexas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
Emu, Injamamul Hoque
[1
]
Droopad, Ravi
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Texas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
Texas State Univ, Mat Sci Engn & Commercializat Program, San Marcos, TX 78666 USATexas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
Droopad, Ravi
[1
,2
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Haque, Ariful
[1
,2
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机构:
[1] Texas State Univ, Ingram Sch Engn, Elect Engn, San Marcos, TX 78666 USA
[2] Texas State Univ, Mat Sci Engn & Commercializat Program, San Marcos, TX 78666 USA
Thermally induced dielectric and conductivity properties of an Sn-doped beta-Ga2O3 (-201) single crystal were investigated by frequency-domain impedance spectroscopy in the frequency window from 100 Hz to 1 MHz with temperatures between 293 and 873 K. The (-201) plane-orientated single crystalline nature and the presence of an Sn dopant in beta-Ga2O3 were confirmed by X-ray diffraction (XRD) and X-ray photoelectron (XPS) spectroscopy. Two different trends of impedance spectra have been discussed by the modulation of relaxation times and semiconductor to metallic transition after similar to 723 K due to activation of a significant number of Sn dopants and their movements with temperature. The negative impedance values were encountered in the Nyquist plots (Z ' vs Z '') after 573 K and constitute a reverse movement after 723 K with temperature. The average normalized change (Delta Z '/Delta f)/Z(0) of impedance exhibits a broad downward relaxation plateau near 723 K, indicating a weak electrical transition. The increases in the positive value of the dielectric constant (epsilon '(r)) below a percolating threshold temperature 573 K is attributed to the interfacial and dipolar polarizations, and the plasma oscillation of delocalized electrons governed by the Drude theory is responsible for the negative dielectric constant above 573 K. The 3D projections of the real dielectric constant create a sharp downward sinkhole near 723 K, indicating the existence of negative dielectric permittivity. The electrical conductivity dramatically changes its trends after 523 K and confirms a transition from hopping conduction (dielectric or semiconductor) following Jonscher's power law to metallic conduction by Drude theory. Below the percolating threshold temperature, a nonoverlapping small polaron tunneling conduction mechanism was unveiled with defect-induced activation energy of 0.21 eV. The Sn-doped beta-Ga2O3 exhibits unique and tailored electromagnetic responses with temperatures that can be associated with a variety of applications in electromagnetic wave manipulations, cloaking devices, antennas, sensors, medical imaging, seismic wave propagation, etc.
机构:
South China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Guangdong Prov Key Lab Chip & Integrat Technol, Guangzhou 510631, Peoples R China
Hangzhou Inst Opt & Fine Mech, Hangzhou 311421, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Wei, Jinshan
Bu, Yuzhe
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Bu, Yuzhe
Sai, Qinglin
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Sai, Qinglin
Qi, Hongji
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Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
Hangzhou Inst Opt & Fine Mech, Hangzhou 311421, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Qi, Hongji
Li, Jingbo
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South China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Guangdong Prov Key Lab Chip & Integrat Technol, Guangzhou 510631, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Li, Jingbo
Gu, Huaimin
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South China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
Guangdong Prov Key Lab Chip & Integrat Technol, Guangzhou 510631, Peoples R ChinaSouth China Normal Univ, Sch Semicond Sci & Technol, Foshan 528225, Peoples R China
机构:
Chinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Univ Sci & Technol China, Hefei 230026, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Hu, Shudong
Liu, Ningtao
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Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Zhejiang Prov Engn Res Ctr Energy Optoelect Mat &, Ningbo 315201, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Liu, Ningtao
Li, Teng
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Chinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Univ Sci & Technol China, Hefei 230026, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Li, Teng
Han, Dongyang
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Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Zhejiang Prov Engn Res Ctr Energy Optoelect Mat &, Ningbo 315201, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Han, Dongyang
Zhuo, Hao
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Chinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Univ Sci & Technol China, Hefei 230026, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Zhuo, Hao
Shao, Botao
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Chinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Univ Sci & Technol China, Hefei 230026, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Shao, Botao
Zhang, Xiaoli
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Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Zhejiang Prov Engn Res Ctr Energy Optoelect Mat &, Ningbo 315201, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Zhang, Xiaoli
Zhang, Wenrui
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Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Zhejiang Prov Engn Res Ctr Energy Optoelect Mat &, Ningbo 315201, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China
Zhang, Wenrui
Chen, Feng
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Chinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R ChinaChinese Acad Sci, Anhui Prov Key Lab Low Energy Quantum Mat & Device, High Magnet Field Lab, HFIPS, Hefei 230031, Anhui, Peoples R China