Over 2 GW/cm2 low-conduction loss Ga2O3 vertical SBD with self-aligned field plate and mesa termination

被引:4
|
作者
Xu, Xiaorui [1 ]
Deng, Yicong [1 ]
Li, Titao [1 ]
Chen, Duanyang [2 ]
Wang, Fangzhou [3 ]
Yu, Cheng [3 ]
Qi, Hongji [2 ]
Wang, Yang [3 ]
Zhang, Haizhong [1 ]
Lu, Xiaoqiang [1 ]
机构
[1] Fuzhou Univ, Coll Phys & Informat Engn, Fuzhou 350116, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Res Ctr Laser Crystal, Shanghai 201800, Peoples R China
[3] Songshan Lake Mat Lab, Dongguan 523808, Peoples R China
关键词
SCHOTTKY-BARRIER DIODE;
D O I
10.1063/5.0212785
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this Letter, a Ga2O3 vertical Schottky barrier diode (SBD) with self-aligned field plate and mesa termination is fabricated and studied. The combination of field plate and mesa termination can effectively make the electric field distribution uniform in the termination, and thus the proposed SBD features high breakdown voltage (BV). Moreover, to eliminate alignment deviation and simplify the fabrication process, a self-aligned etching process is developed. The experimental results show that a low specific on-resistance of 4.405 m Omega<middle dot>cm(2) and a high BV of 3113 V can be simultaneously derived on the proposed SBD, yielding a high power figure of merit of 2.2 GW/cm(2). Meanwhile, a considerably low forward voltage of 1.53 V at 100 A/cm(2) is also achieved, demonstrating the low conduction loss of the device.
引用
收藏
页数:5
相关论文
共 50 条
  • [21] Self-aligned patterning on β-Ga2O3 substrates via backside-exposure photolithography
    Oshima, Takayoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (01)
  • [22] Heteroepitaxial ε-Ga2O3 MOSFETs on a 4-inch Sapphire Substrate with a Power Figure of Merit of 0.29 GW/cm2
    Zeng, Deke
    Zhu, Shengheng
    Luo, Tiecheng
    Chen, Weiqu
    Chen, Zimin
    Pei, Yanli
    Wang, Gang
    Lu, Xing
    2024 36TH INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND IC S, ISPSD 2024, 2024, : 192 - 195
  • [23] Breakdown mechanism in 1 kA/cm2 and 960 V E-mode β-Ga2O3 vertical transistors
    Hu, Zongyang
    Nomoto, Kazuki
    Li, Wenshen
    Zhang, Zexuan
    Tanen, Nicholas
    Quang Tu Thieu
    Sasaki, Kohei
    Kuramata, Akito
    Nakamura, Tohru
    Jena, Debdeep
    Xing, Huili Grace
    APPLIED PHYSICS LETTERS, 2018, 113 (12)
  • [24] 1.2 kV/2.9 mΩ.cm2 Vertical NiO/β-Ga2O3 Heterojunction Diodes with High Switching Performance
    Hu, Yawci
    Wang, Shanyong
    Yang, Ziqi
    Chen, Rongsheng
    Lu, Xing
    Ren, Yuan
    Zhou, Xianda
    Chen, Zimin
    Pei, Yanli
    Wang, Gang
    PROCEEDINGS OF THE 2020 32ND INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD 2020), 2020, : 178 - 181
  • [25] Low defect density and small I - V curve hysteresis in NiO/β-Ga2O3 pn diode with a high PFOM of 0.65 GW/cm2
    Hao, Weibing
    He, Qiming
    Zhou, Kai
    Xu, Guangwei
    Xiong, Wenhao
    Zhou, Xuanze
    Jian, Guangzhong
    Chen, Chen
    Zhao, Xiaolong
    Long, Shibing
    APPLIED PHYSICS LETTERS, 2021, 118 (04)
  • [26] Low temperature electron mobility exceeding 104 cm2/V s in MOCVD grown β-Ga2O3
    Alema, Fikadu
    Zhang, Yuewei
    Osinsky, Andrei
    Valente, Nicholas
    Mauze, Akhil
    Itoh, Takeki
    Speck, James S.
    APL MATERIALS, 2019, 7 (12):
  • [27] Vertical β-Ga2O3 Schottky barrier diodes with trench staircase field plate
    Kumar, Sandeep
    Murakami, Hisashi
    Kumagai, Yoshinao
    Higashiwaki, Masataka
    APPLIED PHYSICS EXPRESS, 2022, 15 (05)
  • [28] Dry and wet etching for ?-Ga2O3 Schottky barrier diodes with mesa termination
    Okumura, Hironori
    Tanaka, Taketoshi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2019, 58 (12)
  • [29] Junction-based deep mesa termination for multi-kilovolt vertical β-Ga2O3 power devices
    Wan, Jiangbin
    Wang, Hengyu
    Zhang, Chi
    Wang, Ce
    Cheng, Haoyuan
    Ye, Jiandong
    Zhang, Yuhao
    Sheng, Kuang
    APPLIED PHYSICS LETTERS, 2025, 126 (03)
  • [30] Fast switching Ga2O3 Schottky barrier power diode with beveled-mesa and BaTiO3 field plate edge termination
    Sun, N.
    Gong, H. H.
    Hu, T. C.
    Zhou, F.
    Wang, Z. P.
    Yu, X. X.
    Ren, F. -f
    Gu, S. L.
    Lu, H.
    Zhang, R.
    Ye, J. D.
    APPLIED PHYSICS LETTERS, 2024, 125 (17)