EUV Scatterometry - Low-Dose Characterization of Polymer-based Metamaterials

被引：0
|
作者：
Jenkins, Nicholas W. [1 ]
Esashi, Yuka [1 ]
Shao, Yunzhe [1 ]
Tanksalvala, Michael [1 ]
Kapteyn, Henry C. [1 ,2 ]
Murnane, Margaret M. [1 ]
Atkinson, Matthew [3 ]
机构：
[1] Univ Colorado, JILA, STROBE NSF Sci & Technol Ctr, Boulder, CO 80309 USA
[2] KMLabs Inc, Boulder, CO 80301 USA
[3] 3M Co, Corp Res Analyt Lab, St Paul, MN 55144 USA
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVIII | 2024年 / 12955卷
关键词：
EUV metrology; reflectometry; scatterometry; phase retrieval; ptychography; high-harmonic generation; low-dose;
D O I：
10.1117/12.3009911
中图分类号：
TP18 [人工智能理论];
学科分类号：
081104 ; 0812 ; 0835 ; 1405 ;
摘要：
We present recent experiments conducted with our tabletop EUV reflectometer to characterize the detailed geometry, composition, and topography of several nanostructured, polymer-based samples. The EUV measurements are performed without sample damage or any significant sample preparation. Correlative STEM measurements confirm the EUV results, but require extensive sample preparation.
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页数：3
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