共 50 条
- [34] Study of C4F8/N2 and C4F8/Ar/N2 plasmas for highly selective organosilicate glass etching over Si3N4 and SiC JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (05): : 1708 - 1716
- [36] DIELECTRIC STRENGTH OF GAS-MIXTURES COMPRISING SF6,CO,C-C4-F8 AND SF6,N2,C-C4F8 IEEE TRANSACTIONS ON POWER APPARATUS AND SYSTEMS, 1983, 102 (05): : 1445 - 1451
- [38] Effects of N2 addition on density and temperature of radicals in 60 MHz capacitively coupled c-C4F8 gas plasma JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (05): : 1760 - 1763