Effects of cold plasma on the growth and aflatoxin production of Aspergillus flavus

被引:2
|
作者
Zhao, Xubo [1 ,2 ]
Wang, Nannan [1 ,2 ]
Lu, Yangyang [1 ,2 ]
Li, Yongxiang [1 ,2 ]
Zhao, Tong [1 ,2 ]
Xu, Jinping [1 ,2 ]
Liu, Bin [1 ,2 ]
Shao, Kan [3 ]
Wang, Zhouli [1 ,2 ]
Yuan, Yahong [4 ]
Yue, Tianli [4 ]
机构
[1] Northwest A&F Univ, Coll Food Sci & Engn, 22 Xi Nong Rd, Yangling 712100, Peoples R China
[2] Minist Agr & Rural Affairs Peoples Republ China, Lab Qual & Safety Risk Assessment Agroprod Yanglin, Yangling 712100, Peoples R China
[3] Indiana Univ, Sch Publ Hlth Bloomington, Dept Environm & Occupat Hlth, Bloomington, IN 47405 USA
[4] Northwest Univ, Coll Food Sci & Engn, Xian 710069, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
Dielectric barrier discharge plasma; Aspergillus flavus; Fungal inactivation; Aflatoxins; Oxidative stress; DECONTAMINATION;
D O I
10.1016/j.fbio.2024.104552
中图分类号
TS2 [食品工业];
学科分类号
0832 ;
摘要
Cold plasma (CP) has an inactivating effect on bacteria, but little research has been done on fungi, especially on aflatoxin (AF)-producing strains of Aspergillus flavus (A. flavus). In this study, a CP device was utilized to investigate the destructive effects and mechanisms of different voltage treatments on AF-producing A. flavus strains. The inactivation curve was fitted using Weibull and Logistics kinetic models (R-2 > 0.930). The results of viable spore count and AF detection showed that after 6 min of 60 V treatment, the total number of viable spores decreased by 4.47 log(10) CFU/mL, and the AF level was found to be significantly lower after treatment (p < 0.05). The microstructure of A. flavus spores was severely damaged after DBDP treatment. The leakage of nucleic acids and proteins, lipid oxidation level, reactive oxygen level, and Fourier transform infrared spectroscopy analysis of spores all confirmed that the cell membrane of A. flavus was damaged after DBDP treatment. This study could provide reference methods for CP technology in the control of AF-producing A. flavus.
引用
收藏
页数:9
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