Protocol for nanoscale thermal mapping of electronic devices using atomic force microscopy with phase change material

被引：0

作者：

Cheng, Qilong ^{[1
,2
,3
]}

Rajauria, Sukumar ^{[1
]}

Schreck, Erhard ^{[1
]}

Smith, Robert ^{[1
]}

Wang, Na ^{[1
]}

Reiner, Jim ^{[1
]}

Dai, Qing ^{[1
]}

Bogy, David

机构：

[1] Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA

[2] Western Digital Corp, Recording Sub Syst Staging & Res, San Jose, CA 95135 USA

[3] Columbia Univ, Dept Appl Phys & Appl Math, New York, NY 10027 USA

来源：

STAR PROTOCOLS | 2024年 / 5卷 / 02期

关键词：

Atomic Force Microscopy (AFM); Material sciences; Microscopy; Physics;

D O I：

10.1016/j.xpro.2024.103039

中图分类号：

Q5 [生物化学];

学科分类号：

071010 ; 081704 ;

摘要：

In this protocol, we present a facile nanoscale thermal mapping technique for electronic devices by use of atomic force microscopy and a phase change material Ge 2 Sb 2 Te 5 . We describe steps for Ge 2 Sb 2 Te 5 thin film coating, Ge 2 Sb 2 Te 5 temperature calibration, thermal mapping by varying heater power, and thermal mapping by varying heating time. The protocol can be applied for resolving surface temperatures of various operational microelectronic devices with a nanoscale precision. For complete details on the use and execution of this protocol, please refer to Cheng et al. 1

引用

页数：11

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