Simultaneous electric dipoles and flat-band voltage modulation in 4H-SiC MOS capacitors through HfO2/SiO2 interface engineering

We report an approach to simultaneously tune the electric dipoles and flat-band voltage (V FB) of 4H-silicon carbide (SiC) metal-oxide-semiconductor (MOS) capacitors through high-k oxide dielectric interface engineering. With an additional HfO2 thin layer on atomic layer deposition (ALD) of SiO2 film, a dipole layer was formed at the HfO2/SiO2 interface, leading to a small positive shift of the V FB of 0.3 V in 4H-SiC MOS capacitors. The Kelvin probe method was used to examine the dipole layers induced at the direct-contact oxide/4H-SiC interfaces. It was found that a minor difference of 0.3 V in the contact potential difference (V CPD) is observed between the SiO2/4H-SiC and HfO2/SiO2/4H-SiC stacks, which signifies the presence of a weak interface dipole layer at the interface of HfO2 and SiO2. Additionally, investigation of the interface state density reveals that ALD of the HfO2 process had a negligible impact on the quality of the SiO2/4H-SiC interface, suggesting that the observed small positive V FB shift originated from the HfO2/SiO2 interface rather than the SiO2/4H-SiC interface.