BARRIER INHOMOGENEITIES ON A SI-SIO2 INTERFACE BY SCANNING INTERNAL PHOTOEMISSION

被引：74
|
作者：
DISTEFAN.TH
机构：
来源：
APPLIED PHYSICS LETTERS | 1971年 / 19卷 / 08期
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D O I：
10.1063/1.1653918
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：280 / &
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