MAGNETIC CO/AL MULTILAYERS PREPARED BY PLANAR MAGNETRON SPUTTERING

被引：3
|
作者：
CUI, FZ
WANG, JF
FAN, YD
LI, HD
机构：
[1] Department of Materials Science and Engineering, Tsinghua University
来源：
JOURNAL OF APPLIED PHYSICS | 1991年 / 70卷 / 06期
关键词：
D O I：
10.1063/1.349279
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Structures and magnetic properties of Co/Al multilayers prepared by means of planar magnetron sputtering were investigated. We compare the results with those of the previously reported films fabricated by electron-beam deposition. It is found that remarkable differences exist between the films synthesized by the two methods. For example, the sputtered multilayers show a transition from in-plane to out-of-plane magnetization at a crossover thickness of Co layer from 14 to 7 angstrom. For samples with t(Co) less-than-or-equal-to 6 angstrom, the Co layers were discontinuous. Formation of the CoAl compound in the samples has not been observed.
引用
收藏
页码：3379 / 3381
页数：3
相关论文
共 50 条
  • [21] PLANAR MAGNETRON SPUTTERING
    WAITS, RK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02): : 179 - 187
  • [22] TRANSPARENT CONDUCTIVE ZNO/AL FILMS PREPARED BY THE PLANAR MAGNETRON SPUTTERING SYSTEM WITH OBLIQUELY FACING TARGETS
    TOMINAGA, K
    SUEYOSHI, Y
    IMAI, H
    SHINTANI, Y
    SURFACE & COATINGS TECHNOLOGY, 1993, 62 (1-3): : 683 - 687
  • [23] MAGNETORESISTANCE AND MAGNETIC-PROPERTIES OF NIFE/OXIDE/CO JUNCTIONS PREPARED BY MAGNETRON SPUTTERING
    PLASKETT, TS
    FREITAS, PP
    BARRADAS, NP
    DASILVA, MF
    SOARES, JC
    JOURNAL OF APPLIED PHYSICS, 1994, 76 (10) : 6104 - 6106
  • [24] Lattice mismatch induced weak perpendicular anisotropy in Fe/Co multilayers prepared by direct current magnetron sputtering
    Xia, A. L.
    Zhang, H. L.
    Tong, L. N.
    Han, B. S.
    THIN SOLID FILMS, 2008, 516 (21) : 7653 - 7656
  • [25] LARGE KERR ROTATION ANGLE AND MAGNETIC CHARACTERISTICS OF CO-CR/AL MULTILAYERS PREPARED BY PLASMA-FREE SPUTTERING
    HIRATA, T
    NAOE, M
    IEEE TRANSACTIONS ON MAGNETICS, 1992, 28 (05) : 2964 - 2966
  • [26] Optical characteristics of Si/SiO2 multilayers prepared by magnetron sputtering
    Xiao, Hong
    Huang, Shihua
    Zheng, Jufang
    Xie, Guanqun
    Xie, Yunlong
    MICROELECTRONIC ENGINEERING, 2009, 86 (11) : 2342 - 2346
  • [27] TiN/AIN bilayers and multilayers grown by magnetron co-sputtering
    Auger, MA
    Sanchez, O
    Ballesteros, C
    Jergel, M
    Aguilar-Frutis, M
    Falcony, C
    THIN SOLID FILMS, 2003, 433 (1-2) : 211 - 216
  • [28] ZnO:Al films prepared by inline DC magnetron sputtering
    Bingel, Astrid
    Fuechsel, Kevin
    Kaiser, Norbert
    Tuennermann, Andreas
    ADVANCED OPTICAL TECHNOLOGIES, 2014, 3 (01) : 103 - 111
  • [29] Structure and composition of (Ti,Al)N films prepared by rf planar magnetron sputtering using a composite target
    Inoue, S
    Uchida, H
    Hioki, A
    Koterazawa, K
    Howson, RP
    THIN SOLID FILMS, 1995, 271 (1-2) : 15 - 18
  • [30] Simulation and optimization of magnetic field for planar magnetron sputtering target
    Liu, Qirong
    Dong, Guobo
    Gao, Fangyuan
    Xiao, Yu
    Diao, Xungang
    Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology, 2013, 33 (12): : 1223 - 1228
12345