STUDY OF ION-IMPLANTATION GETTERING OF GOLD IN SILICON

被引：0

作者：

LO, MJT

SKALNIK, JG

ORDUNG, PF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 11期

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D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C470 / C470

页数：1

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