PRE-EPITAXIAL AND POST-EPITAXIAL GETTERING OF STACKING-FAULTS IN SILICON

被引:0
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作者
CHEN, MC
SILVESTRI, VJ
机构
[1] NATL CHIAO TUNG UNIV,COLL ENGN,HSINCHU,TAIWAN
[2] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
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D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
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页码:C368 / C368
页数:1
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