EPITAXIAL GROWTH OF GERMANIUM ON SILICON

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作者：

OLDHAM, WG

RIBEN, AR

FEUCHT, DL

MILNES, AG

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1963年 / 110卷 / 03期

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中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

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页码：C53 / C53

页数：1

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