ACID-CATALYZED DEPROTECTION AND REARRANGEMENT IN RESIST DESIGN

被引：0

作者：

ITO, H ^{[1
]}

UEDA, M ^{[1
]}

ENGLAND, WP ^{[1
]}

机构：

[1] IBM CORP,DIV RES,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1989年 / 198卷

关键词：

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：14 / PMSE

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