KINETICS OF WSI2 FORMATION IN THIN-FILM SYSTEM W-PTSI-SI

被引：21
|
作者：
SINHA, AK [1 ]
SMITH, TE [1 ]
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源：
JOURNAL OF APPLIED PHYSICS | 1973年 / 44卷 / 08期
关键词：
D O I：
10.1063/1.1662786
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3465 / 3469
页数：5
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