HIGH-RATE LOW KINETIC-ENERGY GAS-FLOW-SPUTTERING SYSTEM

被引：68
|
作者：
ISHII, K
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 02期
关键词：
D O I：
10.1116/1.576129
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：256 / 258
页数：3
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