Microscopic Observation of Degradation of LaNiO3 Ultrathin Films Caused by Air Exposure

被引:2
|
作者
Wakabayashi, Yusuke [1 ]
Maeda, Hiroki [1 ]
Kimura, Tsuyoshi [1 ]
Sakata, Osami [2 ,3 ]
Sakai, Enju [4 ,5 ]
Kumigashira, Hiroshi [4 ]
机构
[1] Osaka Univ, Grad Sch Engn Sci, Div Mat Phys, Toyonaka, Osaka 5608531, Japan
[2] Natl Inst Mat Sci NIMS, Synchrotron Xray Stn, Sayo 6795148, Japan
[3] Natl Inst Mat Sci NIMS, SPring 8, Sayo 6795148, Japan
[4] High Energy Accelerator Res Org, Tsukuba, Ibaraki 3050801, Japan
[5] Univ Tokyo, Sch Engn, Dept Chem Syst Engn, Kashiwa, Chiba 2778589, Japan
关键词
X-ray scattering; diffraction; and reflection; Oxidation; Nickel oxides; Heterojunctions;
D O I
10.1380/ejssnt.2016.14
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Sample degradation of LaNiO3 ultrathin films on SrTiO3 (001) substrate caused by air exposure is examined by means of crystal truncation rod (CTR) scattering method. Although the film is conductive right after the sample deposition, long term storage makes it insulating. CTR measurements were performed on three-and four-unit cell-thick samples just after the sample deposition and after six months of storage in air. The results show that the storage induced a significant increase in the lattice spacing along the surface normal direction with keeping in-plane periodicity. Such a structural change can be caused by escaping oxygen atoms by the thermal fluctuation.
引用
收藏
页码:14 / 16
页数:3
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