CRYSTALLIZATION BEHAVIOR AND LOCAL ORDER OF AMORPHOUS GEXTE1-X FILMS

被引：22
|
作者：
OKABE, T [1 ]
NAKAGAWA, M [1 ]
机构：
[1] TOYAMA UNIV,DEPT EARTH SCI,TOYAMA 930,JAPAN
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1986年 / 88卷 / 2-3期
关键词：
D O I：
10.1016/S0022-3093(86)80020-5
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：182 / 195
页数：14
相关论文
共 50 条
  • [41] Crystallization behavior of amorphous Alx(Ge2Sb2Te5)1-x thin films
    Seo, Jae-Hee
    Song, Ki-Ho
    Lee, Hyun-Yong
    JOURNAL OF APPLIED PHYSICS, 2010, 108 (06)
  • [42] THE CRYSTALLIZATION OF AMORPHOUS SIXTE1-X
    GAUER, MK
    DEZSI, I
    GONSER, U
    LANGOUCHE, G
    RUPPERSBERG, H
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1989, 109 (2-3) : 247 - 254
  • [43] Crystallization behavior of amorphous terfenol-D thin films
    Loveless, M
    Guruswamy, S
    Shield, JE
    IEEE TRANSACTIONS ON MAGNETICS, 1997, 33 (05) : 3937 - 3939
  • [44] Nickel induced lateral crystallization behavior of amorphous silicon films
    Li, JF
    Sun, XW
    Yu, MB
    Qi, GJ
    Zeng, XT
    APPLIED SURFACE SCIENCE, 2005, 240 (1-4) : 155 - 160
  • [45] Crystallization behavior of amorphous BaTiO3 thin films
    Gyung Hyun Ryu
    Neal P. Lewis
    George N. Kotsonis
    Jon-Paul Maria
    Elizabeth C. Dickey
    Journal of Materials Science, 2020, 55 : 8793 - 8801
  • [46] Effect of plasma treatment on crystallization behavior of amorphous silicon films
    Pangal, K
    Sturm, JC
    Wagner, S
    AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 : 577 - 582
  • [47] Crystallization behavior of amorphous BaTiO3 thin films
    Ryu, Gyung Hyun
    Lewis, Neal P.
    Kotsonis, George N.
    Maria, Jon-Paul
    Dickey, Elizabeth C.
    JOURNAL OF MATERIALS SCIENCE, 2020, 55 (21) : 8793 - 8801
  • [48] Local electron beam induced reduction and crystallization of amorphous titania films
    Kern, Philippe
    Jaeggi, Christian
    Utke, Ivo
    Friedli, Vinzenz
    Michler, Johann
    APPLIED PHYSICS LETTERS, 2006, 89 (02)
  • [49] The crystallization kinetics of nanothin amorphous TlGa1-x Ge x Se2 films
    Alekberov, E. Sh.
    Sharifova, A. K.
    Ismayilov, D. I.
    CRYSTALLOGRAPHY REPORTS, 2009, 54 (03) : 513 - 515
  • [50] CRYSTALLIZATION OF AMORPHOUS SB1-XBIX (X LESS THAN OR EQUAL TO 0.2) FILMS
    HASHIMOTO, M
    OGIHARA, H
    KAMBE, K
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (02) : L99 - L102
12345