ISSUES ENCOUNTERED WITH MULTILEVEL INTERCONNECT PROCESSING IN THE SUB-MICRON REGIME

被引:0
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作者
MATTOX, RJ [1 ]
WILSON, SR [1 ]
机构
[1] MOTOROLA INC,SEMICOND PROD SECT,MESA,AZ 85202
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中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:C134 / C134
页数:1
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