THE EFFECT OF FILM THICKNESS ON THE REFLECTIVITY OF GLOW-DISCHARGE AMORPHOUS-SILICON

被引:6
|
作者
DONNADIEU, A [1 ]
WEISER, G [1 ]
BEICHLER, J [1 ]
机构
[1] UNIV MARBURG,FACHBEREICH PHYS CHEM,D-3550 MARBURG,FED REP GER
来源
SOLAR ENERGY MATERIALS | 1981年 / 4卷 / 04期
关键词
D O I
10.1016/0165-1633(81)90021-6
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
引用
收藏
页码:455 / 459
页数:5
相关论文
共 50 条
  • [11] THE NUCLEATION AND GROWTH OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON
    COLLINS, RW
    PAWLOWSKI, A
    JOURNAL OF APPLIED PHYSICS, 1986, 59 (04) : 1160 - 1166
  • [12] EFFECT OF PREPARATION CONDITIONS ON THE PROPERTIES OF GLOW-DISCHARGE INTRINSIC AMORPHOUS-SILICON
    GUTIERREZ, MT
    CARABE, J
    GANDIA, JJ
    SOLONKO, A
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 1992, 26 (03) : 259 - 268
  • [13] DOPING GLOW-DISCHARGE AMORPHOUS-SILICON BY METAL COEVAPORATION
    PERLUZZO, G
    AKTIK, C
    CURRIE, JF
    POULINDANDURAND, S
    YELON, A
    BREBNER, JL
    COCHRANE, RW
    CANADIAN JOURNAL OF PHYSICS, 1987, 65 (08) : 1027 - 1029
  • [14] ABSORPTION-EDGE AND REFLECTIVITY OF GLOW-DISCHARGE AMORPHOUS SILICON
    WIEDER, H
    CHEVALLIER, J
    GUARNIERI, CR
    ONTON, A
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1977, 22 (03): : 335 - 335
  • [15] PLASMA SPECTROSCOPY GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON
    MATSUDA, A
    TANAKA, K
    THIN SOLID FILMS, 1982, 92 (1-2) : 171 - 187
  • [16] EFFECT OF SUBSTRATE-TEMPERATURE ON THE NUCLEATION OF GLOW-DISCHARGE HYDROGENATED AMORPHOUS-SILICON
    COLLINS, RW
    CAVESE, JM
    APPLIED PHYSICS LETTERS, 1986, 49 (18) : 1207 - 1209
  • [17] A MODEL OF AMORPHOUS-SILICON DEPOSITION IN DC GLOW-DISCHARGE IN SILANE
    YAMAGUCHI, Y
    SUMIYAMA, A
    HATTORI, R
    MOROKUMA, Y
    MAKABE, T
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1989, 22 (04) : 505 - 511
  • [18] FATIGUE EFFECT IN LUMINESCENCE OF GLOW-DISCHARGE AMORPHOUS-SILICON AT LOW-TEMPERATURES
    MORIGAKI, K
    HIRABAYASHI, I
    NAKAYAMA, M
    NITTA, S
    SHIMAKAWA, K
    SOLID STATE COMMUNICATIONS, 1980, 33 (08) : 851 - 856
  • [19] FREQUENCY-DEPENDENT LOSS IN GLOW-DISCHARGE AMORPHOUS-SILICON
    SHIMAKAWA, K
    LONG, AR
    ANDERSON, MJ
    IMAGAWA, O
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1987, 97-8 : 623 - 626
  • [20] DEPOSITION TECHNIQUE FOR AMORPHOUS-SILICON - GLOW-DISCHARGE DECOMPOSITION OF SILANE
    MATSUDA, A
    DENKI KAGAKU, 1984, 52 (07): : 398 - 402