Fundamentals of Metal Deposition via Surface Limited Redox Replacement of Underpotentially-Deposited Monolayer

被引：10
|
作者：
Brankovic, Stanko R. [1 ,2 ]
机构：
[1] Univ Houston, Dept Elect & Comp Engn, Houston, TX 77004 USA
[2] Univ Houston, Dept Chem & Biomol Engn, Houston, TX 77004 USA
来源：
ELECTROCHEMICAL SOCIETY INTERFACE | 2018年 / 27卷 / 02期
基金：
美国国家科学基金会;
关键词：
D O I：
10.1149/2.F05182if
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：57 / 63
页数：7
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