VISIBLE-LIGHT EMISSION FROM SI MATERIALS

被引:27
|
作者
STEIGMEIER, EF
AUDERSET, H
DELLEY, B
MORF, R
机构
[1] Paul Scherrer Institute, Zurich
关键词
D O I
10.1016/0022-2313(93)90097-7
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The photoluminescence of electrochemically etched silicon under excitation in the wavelength range from 325 to 514 nm is described by a single energy gap (of order of 1.9 eV). The Raman spectra can be explained by a Gaussian phonon confinement to a geometrical structure size of about 3 nm. In addition, the novel method of spark erosion for a non-liquid preparation of light-emitting silicon has been used, and it is shown that the light emission spectrum, apart from its overall intensity, is independent of environment gas species (N-2, O-2 or H-2). In areas of higher electric field strength, presumably leading to a smaller effective size, a blue shift is observed in all these cases. This appears to rule out any siloxene-derivate models and suggests a quantum confinement as the basic phenomenon.
引用
收藏
页码:9 / 12
页数:4
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